5th International Meeting on Electrowetting

31 May to 2 June, 2006
Rochester, New York (USA)

sponsored by
Department of Electrical & Computer Engineering
University of Rochester
program     registration     authors     venue     corporate support

Interest in the science and practical application of electrowetting continues to grow. Considerable progress in understanding the phenomena and its relationship to classical electrocapillarity has been reported, and commercially significant applications for electrowetting are approaching the product announcement stage. The steadily broadening scope of papers reveals that innovative applications, including liquid dispensers, optoelectronic devices, and fluidic control schemes, are now receiving consideration. Nevertheless, intriguing puzzles remain to be solved, including the basic mechanisms of saturation, the nature of contact line forces, and the entire question of electrowetting-based dynamics.

The 5th International Meeting on Electrowetting will bring together key scientists and engineers to present their recent work, to define and discuss the outstanding issues, and to outline research directions for the future. The format imitates previous events at Mons (1999), Eindhoven (2000), Grenoble (2002), and Blaubeuren (2004). The schedule will balance invited lectures with contributed papers, and with adequate time reserved for discussion of each presentation. The poster session will be complemented by gourmet pizza, salad, wine, and beer. Attendance will be limited to approximately 70 participants.

The meeting venue is Rochester, New York in western New York State on the southern shore of Lake Ontario. Rochester is closer to Toronto, Canada, than to New York City, only 90 minutes from Niagara Falls and even closer to the beautiful Finger Lakes wine-growing region.

Meeting Schedule:

Wednesday, 31 May
morning - arrival, registration, & lunch
afternoon - welcome & technical session
evening - poster session with wine, beer & pizza

Thursday, 1 June
morning - breakfast & technical session
afternoon - technical session
evening - catered picnic at Webster Beach Park

Friday, 2 June
morning - breakfast & technical session
noon - departure, box lunch provided

Participation is being limited to about 70 persons. Please note that registration is now closed.

If you anticipate any difficulty obtaining the required visa to enter the USA, please contact the organizer well in advance to request a letter of invitation.

Please assist the organizer by distributing this announcement to interested colleagues.

Generous financial support of the following companies is gratefully acknowledged:

* Advanced Liquid Logic, Research Triangle Park, NC (USA)
* Dai Nippon Printing Co., Ltd., Japan
* Eastman Kodak Company, Rochester, NY (USA)
* Philips Research Laboratories, Eindhoven, NL
* Samsung Electromechanics Corp., Suwon, Korea
* TREK, Inc., Medina, NY (USA)
* Varioptic Inc., Lyon, France

program    registration    second circular     TOP    Email

You are visitor number to this web site since February 22nd, 2005.
Last modified: Monday, 13-Feb-2006 14:02:11 EST